中村 圭二 NAKAMURA Keiji
プロフィール
学術論文、評論
Alternating Ion Bombardment Technique for Wall Surface Control in Depositive Plasma Processing, J. Vac. Sci. Tech. A Vol.18, No.1, 2000
Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing, Jpn. J. Appl. Phys. Vol.38, No.9A (pt.1), 1999
Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma, Jpn. J. Appl. Phys. Vol.38, No.9A (pt.1), 1999
Incident Ion Monitoring during Plasma Immersion Ion Implantation by Direct Measurements of High Energy Secondary Electrons, Surf. and Coat. Tech. Vol.93, 1997
講演、シンポジウム、学会発表
Wall Control in Oxide Etcher by Alternating Ion Bombardment, Int. Workshop Basic Aspects of Non-equilibrium Plasmas Interacting with Surfaces (BANPIS-2000), (January 2000, Japan) P1-12
High-Energy Secondary Electron Measurement and Its Application to In-situ Ion Flux Monitoring in Plasma Immersion Ion Implantation, XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases, (August 2000, Hungary) 4-27
Suppression of Current Imbalance between Superconductor Strands by Magnetic Core Method, Applied Superconductivity Conference 2000, (September 2000, U. S. A.) 5LB10
社会活動
電気学会プラズマイオン注入調査専門委員会委員, 1999〜現在
プラズマ・核融合学会編集委員, 1999〜現在
応用物理学会プラズマエレクトロニクス分科会幹事, 1997〜1998