CHUBU UNIVERSITY
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NAKAMURA Keiji

Profile

Title Professor
Belong to Dept. of Electrical and Electronic Engineering
Dept. of Electrical Engineering
Electrical and Electronic Engineering (graduate school)
Graduated Nagoya University, Graduate School of Engineering
Degree Dr. of Engineering, Nagoya University
Academic Institutional Membership The Institute of Electrical Engineers of Japan, The Japan Society of Applied Physics, The Japan Society of Plasma Science and Nuclear Fusion Research, The Institute of Electrical and Electronic Engineering
Field of Study Plasma Engineering, Measuring Engineering
Research, Studies Production, Diagnostics and Control of High Density Plasma Sources, Plasma-based Materials Processing, Plasma Application for Environmental Conservation
Curriculum Specialized Gaseous Electronics A (at Graduate School); Electronic circuit A, Seminar B, Mathmatics for Electrical Engineering
Contact Mail address:nakamura <???> solan.chubu.ac.jp ※ Replace <???> with "@".

Academic Papers, Critique

'Electron Density Range Measurable by Microwave Resonator Probe with Higher Mode Resonance'; Y. Liang, K. Kato, , K. Nakamura and H. Sugai; Japanese Journal of Applied Physics Vol. 50 (2011) , pp. 116101-1- 116101-6

'Modeling Microwave Resonance of Curling Probe for Density Measurements in Reactive Plasmas'; I. Liang, K. Nakamura and H. Sugai; Appl. Phys. Express Vol. 4 (2011) , p. 066101-1

'Observation of Optical Fluorescence of GaN Thin Films in an Inductively-Coupled Plasma Containing High Energy Electrons'; Y. Guo, K. Nakamura and , J. Zhang, Y. Nakano and H. Sugai; Japanese Journal of Applied Physics Vol. 50 (2011) , p. 01AA02-1

'Simulation of Resistive Microwave Resonantor Probe for High Pressure Plasma Diagnostics'; J. Xu, K. Nakamura, , Q. Zhang and H. Sugai; Plasma Sources Science and Technology Vol. 18 (2009) , p. 45009

'Application of Droplet-Free Metal Ion Source to Formation of Gas Barrier Thin Films'; K. Nakamura; Physica Status Solidi c Vol. 5 (2008) , No. 4, pp. 887- 892

'Droplet-Free High-Density Metal Ion Source for Plasma Immersion Ion Implantation'; K. Nakamura, H. Yoshinaga and K. Yukimura; Nuclear Instruments and Methods in Physics research B Vol. 242 (2006) , pp. 315- 317

'Ar/O2 Gas Pressure Dependence of Atomic Concentration of Zirconia Prepared by Ziconium Pulse Arc PBII&D'; K. Yukimura, H. Yoshinaga and , Y. Ohtsu, H. Fujita, K. Nakamura and X. Ma; Nuclear Instruments and Methods in Physics research B Vol. 242 (2006) , pp. 318- 320

'Significant Enhancement of Ion-Induced Secondary Electron Current by Photons in Plasma Immersion Ion Implantation'; K. Nakamura and H. Sugai; Surf. Coat. Technol. Vol. 196 (2005) , No. 1-3, pp. 184- 187

Lectures, Symposium, Presentation

'Curling Probe Monitoring of Plasma CVD and Wall Cleaning Processes'; A. PANDEY, K. KATO. , S. IKEZAWA, K. NAKAMURA and H. SUGAI; 5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) (January 2013, Japan) Tup-A07OA

'In-itu photo luminescence observation of GaN thin film exposed in inductively-coupled plasmas'; M. Chen, K. Nakamura, Y. Nakano and H. Sugai; 5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) (January 2013, Japan) P1030A

'Effects of configuration on resonance characteristics of plane-type microwave resonator probe'; E. Kumazaki, K. Nakamura and H. Sugai; 5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) (January 2013, Japan) P1024.

'In-situ Photoluminescence Measurements of GaN Films Exposed to Inductively-Coupled Plasmas'; K. NAKAMURA, M. CHEN, Y. NAKANO and H. SUGAI; 34th Int. Symp. Dry Process (DPS2012) (November 2012, Japan) P-64

'Monitoring of electron density and wall deposit by curling probe during plasma process'; A. Pandey, M. Imai, H. Kanematsu, S. Ikezawa, K. Nakamura and H. Sugai ; 34th Int. Symp. Dry Process (DPS2012) (November 2012, Japan) E-4

'In Situ Monitoring of Electron Density and Dielectric Layer on the Wall with Curling Probe'; A. PANDEY, Y. LIANG. , S. IKEZAWA, K. NAKAMURA and H. SUGAI; AVS 59th International Symposium and Exhibition (October 2012, U. S. A.) PS1-WeA3

'Novel diagnostic tool, curling probe, for monitoring electron density during plasma processing'; A. PANDEY, Y. LIANG. , S. IKEZAWA, K. NAKAMURA and H. SUGAI; 65th Annual Gaseous Electronics Conference (GEC) (October 2012, U. S. A.) DT1.00004

' In-situ Monitoring of Surface Modification of GaN Films Exposed to Inductively-Coupled Plasmas'; K. NAKAMURA, M. CHEN, Y. NAKANO and H. SUGAI; 65th Annual Gaseous Electronics Conference (GEC) (October 2012, U. S. A.) NW1.00072

'In-situ photoluminescence monitoring of GaN in plasma exposure'; M. Chen, K. Nakamura. , Y. Nakano, S. Yu and H. Sugai; 4th Int. Conf. Microelectronics & Plasma Technology (ICMAP2012) (July 2012, Korea) S021 2012-372, p. 505

'Miniaturization of Plane-Type Microwave Resonator Probe with Multi-Resonant Frequencies'; K. Nakamura, H. Kumazaki and N. Sugai; 5th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2012) (March 2012, Japan) P-01

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